All-in-one HIPIMS Power System
- Pulser based on Multichannel HIPIMS technology
- Synchronized substrate bias with Duty Discharge capability
- Embedded function generator
- Arbitrary waveform of the pulse sequence
- Original software
- Pulser based on Multichannel HIPIMS technology
- Synchronized substrate bias with Duty Discharge capability
- Embedded function generator
- Arbitrary waveform of the pulse sequence
- Original software
There are two base configurations:
1. HIPIMS power supply.
2. HIPIMS with synchronized substrate bias, duty discharge between pulses and embedded digital oscilloscope.
There are also a number of intermedia options, which include selected features from the full version.
Includes control over:
- arbitrary waveform generator
- DC units for HIPIMS and substrate bias
- Embedded 12-bit digital oscilloscope
- Voltage and Current probes
- Unbalanced magnetron with a stronger outer magnet
- Essentially balanced magnetron system
- Unbalanced magnetron with a stronger inner magnet
Multichannel HIPIMS Technology provides for excellent control over stoichiometry and thickness of the obtained coatings.
- Multichannel HIPIMS - Synchronized Substrate Bias - Embedded Function Generator - Internal Digital Oscilloscope - Software
HIPIMS configuration
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